SrSnO3 Field-Effect Transistors With Recessed Gate Electrodes

Abstract

Fabrication of gate-recessed SrSnO3 (SSO) metal-semiconductor field-effect transistors (MESFETs) with Ni Schottky gates is reported on bi-layer epitaxial SSO films with a thin heavily-doped cap layer. Devices with 0.5- $\mu \text{m}$ gate length showed enhancement-mode behavior with a saturation drain current, ${I}_{\text {DSAT}}$ , of 33 mA/mm and peak transconductance, ${g}_{\text {m,max}}$ , of 65 mS/mm. The ${g}_{\text {m,max}}$ value is a roughly $2\times $ improvement over control devices fabricated on single-layer films. Gate-recessed SSO MESFETs with Pt Schottky gates were also explored on the bi-layer films. Devices with 1- $\mu \text{m}$ gate length displayed ${I}_{\text {DSAT}} =133$ mA/mm and $g_{\text {m,max}} =73$ mS/mm, after thermal annealing.