Abstract
Sputtering coefficients of niobium for bombardment by Nb, H, D, and He ions in the 10- to 80-keV range have been measured and compared with theory. The light-ion measurements were obtained by sputtering through a thin film (600 Å) of niobium deposited on a zirconium substrate. Penetration of the film was observed by the appearance of substrate ions in the mass spectrum of sputtered ions from the target.
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