Abstract
Ultra-thin α-Fe2O3 (hematite) films have been deposited by radio frequency (RF) sputtering technique and photoelectrochemically investigated towards their ability to oxidize water. By varying the deposition power and time as well as the sputter gas flow (argon), the microstructure and morphology of the film were optimized. It was found that the increment in the film thickness resulted in the loss of efficiency for solar water oxidation. The film with a thickness of 27 nm exhibited the best result with a maximum photocurrent of 0.25 mA cm−2 at 1.23 VRHE. Addition of small amounts of O2 to the sputter gas improved the photoactivity significantly.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
