Abstract

We fabricated composition gradient sodium potassium niobate [(K,Na)NbO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> , KNN] thin films on (111)Pt/Ti/SiO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> /Si by multi-target RF magnetron sputtering to optimize KNN film composition by combinatorial method. We successfully obtained c-axis oriented KNN thin films with perovskite structure on 6-inch Si wafers. The KNN film composition was measured by energy dispersive x-ray spectroscopy (EDX) and we confirmed composition gradient of K/(K+Na) ratio of the KNN thin film on Si wafer along with the line between KNbO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> and NaNbO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> targets. This result indicates that the combinatorial sputtering is useful for precise optimization of the deposition condition and film composition of the lead-free KNN thin films.

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