Abstract
TiO2 films were prepared by the magnetron sputter system with various oxygen partial pressure ratios, for the application of photovoltaic (PV) cells, TiO2 single-layer and SiO2/TiO2 double-layer antireflection (AR) coatings were deposited on Si substrate. The experimental results indicate that TiO2 film deposited at oxygen partial pressure ratio of 15.4% exhibits smooth surface morphology, amorphous structure, and good optical transmittance, which is suitable for AR coating in the PV cell structure system. Furthermore, the weighted average reflectance in the range of 400–900 nm was about 10.3% and 3.7% for the TiO2 single-layer and SiO2/TiO2 double-layer AR coatings, respectively. With a double-layer AR coating, a 50.8% improvement in the efficiency of a Si PV cell was achieved.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
