Abstract
Simple d.c. sputtering was used for the deposition of ITO films on glass substrates. Their structural, electrical, optical, and chemical properties depend on the substrate temperature. A temperature slightly above 400° C is optimal and leads to an increase of the grain size, mobility, carrier concentration, and conductivity of the layers. The lowest resistivity is 1.88 × 10 −4 Ωcm and relevant transmittivity is 83.3%. Moreover, these layers are noted for a good chemical stability, which enables us to use them as transparent conductive electrodes for the CdSCdTe solar cells prepared by chemical and electrochemical methods. ITO films on unheated substrates do not attain the required properties not even after annealings in various atmospheres.
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