Abstract
We have used radio frequency sputtering from Ni and NiO targets to produce thin films of about 300 A thickness [1 3] . The atomic arrangements in these films were sensitive to the deposition and the substrate temperatures, and the incorporation of oxygen from the sputtering gas. The structures of the films were studied by a scanning electron diffraction technique. F.c.c., h.c.p, and amorphous nickelrich phases as well as cubic, spinel-like and amorphous NiO were observed.
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