Abstract
The preparation of BFO films by sputtering at a temperature as low as 450 °C on glass and commercial Pt/Ti/SiO2/Si(001) substrates have been studied. The underlayers with different orientations were prepared on the glass substrates including strongly textured Pt(111) and L10-FePt(001) induced by rapid thermal annealing process. Isotropic perovskite BFO grains with size of about 200 nm formed on the commercial substrates, showing larger surface roughness. Pt(111) suppresses BiFeO3 phase. Single phase perovskite BFO with strong (001) texture, reduced surface roughness and fine grain size was formed on the L10-FePt(001) buffer layer. Considerable enhancement of ferroelectric properties was achieved as compared to the films grown on commercial substrate.
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