Abstract
An outline of the fundamental principles of compositional depth profiling of thin films by sputtering is given, emphasizing first the importance of optimized experimental conditions in obtaining high resolution depth profiles, in particular sample rotation and low energy primary ions. Based on former and recent developments, the basic approach to profile evaluation and to quantification is briefly reviewed. The fundamental roles of depth resolution and of the depth resolution function are elucidated, including experimental determination and theoretical modeling of the latter by the three fundamental parameters atomic mixing, surface roughness and information depth (MRI-model). Typical application examples for profile reconstruction in depth profiling are presented.
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