Sputter deposition of Ti underlayers with high crystal orientation on glass disk substrates

Abstract

Preparation of Ti films on glass disk substrates by sputter-deposition as underlayers for Co-Cr perpensicular magnetic recording media were investigated. The hcp c-axis orintation to the film normal of Co-Cr film became sharper by putting a highly orinted Ti underlayer for depositions at Ar pressures from 0.2 to 100Pa. It was found that Ti films deposited on glass disk substrates showed cryatal orientations with Δθ50 greater than 7°, while films deposited on slide glasses showed high crystal orientations with Δθ50 less than 5°. The Δθ50 was decreased dramatically by a sputter-etching of the surface of the glass disk substrates prior to the deposition of the films. An XPS analysis reveraled that substantial Si atoms which didn't bond with oxigen were detected in the hetero interface for the non-processed glass substrates, but the concentration was redused by the sputter-etching of the substrate surface, It was suggested that the Si atoms degraded the crystal orientationl of the film.