Sputter deposition of atomically flat Au(111) and Ag(111) films

Abstract

A simple Ar-ion sputter deposition has allowed preparation of atomically flat Au(111) and Ag(111) films in conditions of much lower substrate temperature and/or deposition rate compared with vacuum deposition. At a deposition rate less than 1 Å s −1, Au(111) films with extended terrace structures could be grown on a freshly cleaved and heated mica (∼300°C) without extensive substrate prebaking. Sputtered Ag(111) films could also be grown atomically flat at a similar deposition rate, preferably on Au(111) predeposited on mica. Particularly smooth Ag(111) films often accompanied by hexagonal faceting grew at substrate temperatures, 150–200°C, near the point at which serious clouding of the film surface set in.