Abstract
In the study presented in this paper we attempted to optimize the transmission and resistivity of thin films 10 cm × 10 cm in area. The design of the system used is such that it is possible to control all the parameters affecting the formation of these layers. The nozzle moves above the substrate which is heated to a high temperature. The solution is pulverized by means of a neutral gas ( e.g. nitrogen) sothat it arrives at the substrate in the form of very fine drops. The layer thickness is monitored by observing the interference orders in the thin films, and so we can modify various parameters such as the speed of the solution, the dopant concentration and the substrate temperature whilst ensuring that the thickness is held constant.
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