Abstract
During the development of a plasma imaging system, luminous streaks and instabilities occurred in a pulsed rf glow discharge operated in Ar at reduced pressure. Sputtering sources with a flat cathode having an area of 10–50 cm2 were designed to reproduce the surface spatial structure of the cathode in the plasma emission, providing optical emission spectrometry with spatial resolution for the chemical analysis of the cathode material. Unfortunately, depending on the discharge parameters and design of the discharge cell, spot patterns appeared and disappeared, and at times were stable or unstable. The behavior and possible origin of these patterns are described in this article.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
