Abstract

We have investigated Tamm plasmon structure and periodic metal-dielectric structures with active organic CBP (N,N-dicarbazolyl-4,4-biphenyl) layer. Tamm structure is based on SiO2/TiO2 5 pairs DBR, with 26 nm CBP and 50 nm silver layer on the top of it. Two periodic silver-organic structures using thermal evaporation technique with different CBP layer thickness (15 and 30 nm) was fabricated. The rate of fluorescence intensity decay of Tamm plasmon and periodic structures was experimentally measured in near ultraviolet region. We demonstrate, that decay time of CBP fluorescence intensity in Tamm plasmon structure and periodic metal-organic structures decreases several times.

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