Abstract
This work presents a Silicon based MEMS vibrating mesh atomizer for use in Spin-spray deposition of spin on glass. The device design, fabrication process and application of MEMS atomizer for spin-spray method to create SiO 2 layer is discussed. The experimental study compares the new spin-spray method with the conventional spin coating method. The newly developed method demonstrated enhanced uniformity, less liquid waste, and comparable etch rates. In addition, the new spin-spray method demonstrated increased conformal coating of 3D microstructures of >40 μm thick structures compared to standard spin coating.
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