Abstract

Zn1−xAlxO (x = 0, 0.01, 0.02, 0.03) thin films were deposited on glass substrate using sol-gel spin coating method and the effect of Al doping on their structural, micro-structural, optical and photoluminescence properties were investigated. The XRD results confirm the single phase nature and the successful substitution of Al at Zn site in ZnO thin films. Further with Al doping, the crystallite size, lattice parameters and film thickness were found to decrease. Also, both AFM and SEM results confirm the formation of spherical grains with lower roughness of the films. Al doped (>2%) films shows ∼ 90% transparency in the visible wavelength region. Widening of band gap (3.18–3.34 eV) was observed with increase in Al doping concentration, which was attributed to the Burstein–Moss band-filling effect. The defect induced luminescence at room temperature was studied by photoluminescence spectroscopy. PL spectra of AZO films show sharp peaks in the visible wavelength region. A detailed analysis of photoluminescence of undoped and Al doped ZnO films indicates the inhibition of defect density of electronic states due to substitution of Al3+. The observed emission peaks were attributed to the defect related deep-level emissions. Results suggest possible use of Al doped ZnO films for transparent conducting oxide (TCO) electrodes and light emitting diodes (LED's) applications.

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