Abstract
The enhancement of the electron beam sensitivity of PMMA from 10−5 C/Cm2 to the 10−6 C/cm2 range has been achieved by incorporation of 15 mol % methacrylic anhydride (MAN) groups into the polymer chain. The MAN group is introduced by cyclization of a copolymer of PMMA–MA (poly methyl methacrylate–methacrylic acid) into a terpolymer of PMMA–MA–MAN of 70/15/15 mol % composition. The terpolymer retains all of the exemplary properties of PMMA; high resolution, excellent adhesion, ease of processing and process versatility. The resist has been used for lift-off metallurgy deposition, chrome mask fabrication, and for wet and dry etching of insulators. The enhancement of the sensitivity is primarily due to the higher chain scission and gaseous product formation. The incorporation of the anhyride group also increases the thermal stability of PMMA from 135° to 175°C.
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