Abstract
A combined spectroscopic method of absorption, actinometry, and relative optical emission intensity is employed to determine the absolute CF2 density, the relative F and H densities, H atom excitation temperature and the electron density in dual-frequency (60/2 MHz) capacitively coupled CHF3/Ar plasmas. The effects of different control parameters, such as high-frequency (HF) power, low-frequency (LF) power, gas pressure, gap length and content of CHF3, on the concentration of radical CF2, F, and H and excitation temperature are discussed, respectively. It is found that the concentration of CF2 is strongly dependent on the HF power, operating pressure and the proportion of CHF3 in feed gas, while it is almost independent of the LF power and the gap length. A higher concentration ratio of F to CF2 could be obtained in dual-frequency discharge case. Finally, the generation and decay mechanisms of CF2 and F were also discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
