Spectroscopic study of ionization enhancement in magnetron sputtering with solenoid coil

Abstract

Summary form only given, as follows. Magnetron sputtering is a broadly used process for coating thin films for display applications, semiconductor applications, hard coatings, decorative coatings, optical coatings, and so on. In order to enhance the film properties and deposition rate various magnetron sputtering sources have been developed such as dual magnetron sputtering, ionized magnetron sputtering, grid assisted magnetron sputtering, and so on. We have developed high efficiency magnetron sputtering sources. In this study, we investigated of spectroscopic study for ionization enhancement in the magnetron sputtering process with a solenoid coil. The sputtering cathode used in the experiment is a unbalanced magnetron sputtering source with a Ti target which is coupled with a solenoid coil. The active species were evaluated in terms of the 1st negative system and 2 nd positive system of nitrogen, Ar I (4p'-4s') and Ar II (4p-4s) by optical emission spectroscopy.