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Abstract
The main goal of this work is to obtain the plasma electron temperature Te by optical emission spectroscopy of low pressure microwave argon plasma, as a function of working pressure and microwave power. A plasma system was designed and constructed in our laboratory using a magnetron of domestic microwave oven with power 800W without any commercial part. The applied voltage on the magnetron electrical circuit is changed for the purpose of obtaining the variable values of the microwave power. The spectral detection is performed with a spectrometer of wavelength range (200−1000nm). The working pressure and magnetron applied voltage were 0.3-3.0mbar and 180-240V, respectively. Two methods had been applied to estimate the electron temperature, the ratio of two lines’ intensity and Boltzmann plot method. It was found that, for the plasmas investigated, an increase of the electron temperature when the applied voltage has been increasing, while the electron temperature decreases when the working pressure is increasing.
Highlights
A glow discharge generated by a microwave power applied through coupling of electromagnetic radiation with frequency ranging (0.3-10) GHz is named as microwave induced plasma[1]
This type of plasma may be considered in local thermodynamic equilibrium (LTE) and non-local thermodynamic equilibrium depending on the plasma pressure and the electron number density [3]
Basic motivation of this study is to explore the effects of filling pressures and microwave powers on the excitation and ionization process involved in optical emission
Summary
A glow discharge generated by a microwave power applied through coupling of electromagnetic radiation with frequency ranging (0.3-10) GHz is named as microwave induced plasma[1]. Power supplies working with a frequency of 2.45GHz are common use in industry and domestic microwave oven makes suitable power source for microwave plasma generation [2]. This type of plasma may be considered in local thermodynamic equilibrium (LTE) and non-local thermodynamic equilibrium (non-LTE) depending on the plasma pressure and the electron number density [3]. Among many of the plasma species, electrons have higher thermal velocities due to their lighter mass and can be accelerated by the electromagnetic radiation as compared to other plasma species These energetic electrons in turn may excite or ionize the plasma species having energy of several electron volts above their ground state by inelastic collisions. Argon mixed reactive plasmas is widely used in different material processing applications [6, 7]
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