Abstract
AbstractFor many common types of process materials used in the fabrication of infrared microelectronic devices there is a lack of information available in the literature regarding their thin‐film optical properties over the wavelength range of 2 to 30 micrometers. In this article, spectroscopic ellipsometry is used to determine room‐temperature optical constants in the infrared for a variety of organic and inorganic coatings commonly used in fabrication. Examples include coatings used for photolithography, coating, passivation, planarization, index matching, and stand‐off. Applications include infrared frequency selective surfaces, antennas, micro‐displays, and flexible substrates. (© 2008 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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