Abstract
AlxGa1-xN samples, with different AlN molar fractions, x = 0, 0.15, 0.77, and 1, grown by halide vapor phase epitaxy were implanted with Tm ions. Photoluminescence (PL) measurements revealed that after thermal annealing all the samples exhibit intraionic Tm3+ luminescence. In samples with x > 0, the low temperature emission is dominated by the lines that appear in the near infrared (NIR) spectral region, corresponding to the overlapped 1G4 → 3H5 and 3H4 → 3H6 multiplet transitions. A detailed spectroscopic analysis of NIR emission of the thulium implanted and annealed AlxGa1-xN layers is presented by using temperature dependent steady-state PL, room temperature PL excitation, and time resolved PL. The results indicate that the excitonic features sensitive to the alloy disorder are involved in the excitation population processes of the Tm3+ luminescence and the highest thermal stability for the NIR emission occurs for the AlN:Tm sample.
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