Abstract
We report measurements of the specific heat of thin $^{3}\mathrm{He}$ films ranging in coverage from 10 to 35 \ensuremath{\mu}mol/${\mathrm{m}}^{2}$ over the temperature regime between 0.1 and 1 K. The films were formed in the 0.2-\ensuremath{\mu}m-diameter cylindrical pores of aluminum oxide Anopore membranes. A heat-capacity shoulder centered at a temperature that decreases with increasing thickness is observed. This behavior is similar to that of localized $^{4}\mathrm{He}$ films adsorbed in several heterogeneous substrates. Such a heat capacity signature may be viewed as a universal property of films adsorbed on disordering surfaces; parameters that characterize it are substrate dependent, or nonuniversal. The results are analyzed using existing models for helium films on heterogeneous substrates.
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