Abstract
The article considers the formation of titanium channel optical waveguides in LiTaO3 substrates. These structures were obtained by dry etching of grooves in SF6 plasma and magnetron sputtering of titanium film. After that, waveguides were formed by plasma etching using photoresist as mask. Technological features and modes of microstructure production are described. Al contact pads were produced by magnetron sputtering thin metal films on LiTaO3. Aluminum wires were ultrasonically bonded to Al contact pads using Delvotec 5630. The developed technology of formation of contact pads and bonding modes made it possible to obtain a bonded joint with a bond strength of 23-25 Gs.
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