Abstract
For the study of both the element composition and the microstructure of functional thin films and layers, the ion beam plays an important role. On the one hand, such thin layers can be produced by ion sputter deposition as DC-magnetron sputtering or by ion plating. Ions are also used for the cross-section preparation of thin solid films and layers. This can be either done with focused ion beams (FIB) or with the so called ion beam slope-cutting technique for larger cut areas. Furthermore, ion beams can be used for the actual near-surface or cross-section analysis of thin solid films and layers. Here the typical method of choice is secondary ion mass spectrometry (SIMS), which is a depth-profiling method with typical detection limits down to the ppm range.
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