Spatial Nonuniformity of Photoresponse in SiC UV Avalanche Photodiodes Operating in Linear and Geiger Mode

Abstract

Silicon Carbide's intrinsic material properties, along with the availability of low-defect density, 6" substrates, make it an attractive material system for visible-blind ultraviolet (UV) detectors. Avalanche photodiodes (APDs) made from SiC have been shown to operate both as linear mode detectors with high gain (>10⁷) and as single-photon avalanche detectors (SPADs) with competitive photon detection efficiency. However, reported spatial non-uniformities in photoresponse of these devices will reduce sensitivity [1,2].In this paper, we examine the impact of device geometry, epitaxial variations, and crystal anisotropy on the spatial uniformity of photoresponse in SiC APDs. Photoresponse maps are generated using a fast 285 nm pulsed LED source that is tightly focused to a ~10 µm spot. Response maps are measured for devices with different geometries fabricated on the same chip in both linear-mode and Geiger-mode. Measurements on standard pin diodes will be presented, along with separate absorption, charge, and multiplication (SACM) structures.Experimental results indicate that all devices exhibit localized regions of high photoresponse at gain > 1000 and that the spreading of the photoresponse is highly directional. Finger diodes with 120 μm x 30 μm mesas exhibit good response uniformity with a variation < 30% across the device. In contrast, diodes with 60 and 90 μm square-shaped mesas exhibit similar uniform response spreading along one edge that is bounded by the size of the mesa, but a >10x drop in relative response over ~30-40 μm in the orthogonal direction which is much shorter than the extent of the mesa. Devices with 100 μm circular mesas exhibit somewhat similar results to the square diodes, but with the presence of multiple hot spots in response.Experimental results are analyzed through 3D numerical modeling of devices which accounts for the effects of doping and thickness variations across the substrate as well as the anisotropy of impact ionization. Modeling indicates that small variations in the thickness in the drift regions of a diode can yield meaningful variations in avalanche gain across the mesa. The impact of anisotropic impact ionization will be considered using full-band 3D Monte Carlo calculations. X. Bai, H.-D. Liu, D. C. McIntosh and J. C. Campbell, "High-Detectivity and High-Single-Photon-Detection-Efficiency 4H-SiC Avalanche Photodiodes," IEEE J. Quantum Electron. 45 300-303 (2009). DOI: 10.1109/JQE.2009.2013093.L. Su et al, "Recent progress of SiC UV single photon counting avalanche photodiodes," J. Semicond. 40 121802 (2019). DOI: 10.1088/1674-4926/40/12/121802. Figure 1