Abstract
The authors present a large-area spatial-frequency multiplication fabrication process for patterning one-dimensional periodic structures using multilevel interference lithography. In this process, multiple grating levels with different phase offsets are overlaid by aligning to a reference grating. Each grating level is pattern transfered into a single hard mask layer, effectively reducing the grating period. The linewidth of the grating lines is controlled with nanometer repeatability by plasma etching and an image-reversal process. The authors demonstrate overlay accuracy of 0.6±1.9nm over 16×12mm2 for two levels of 200nm period gratings. Using this process, a subdiffraction-limited resolution grating with 100nm period is fabricated using light with λ=351.1nm. This process can also be used to fabricate more complex periodic geometries.
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