Spatial distributions of the intensity of optical emission lines studied during bismuth ferrite film deposition in high-frequency discharge plasma

Abstract

We have studied spatial distributions of the intensity of optical emission lines in plasma of the RF discharge in oxygen during the deposition of bismuth ferrite (BiFeO3) films. The intensities of characteristic emission lines in the visible, near-UV and near-IR spectral ranges have been measured as functions of the distance from the probed plasma layer to the target. The intensity profiles of the emission lines of oxygen ions, oxygen atoms, and iron atoms exhibit different behavior. Differences in the spatial distributions of intensity have been also observed for the two characteristic emission lines (at 613.7 and 688.6 nm) of iron.