Abstract
The in-plane spatial distribution of photoluminescence (PL) intensity in two-dimensional layers of a type-II (buffer Si1-yGey)/tSi/sSi1-xGex/tSi/(cap Si1-yGey) heterostructure is investigated at liquid-helium temperatures at high excitation levels. It is found that the PL spectra recorded at the excitation spot and the edge of the sample are different. This work examines the dependences of the PL spectra and intensity both on the distance between the observation point and a fixed excitation spot and on the distance between the excitation spot and a fixed observation point at the edge of the sample. The reasons for the observed behavior of the PL are determined.
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