Abstract

Wet deposition of major ions was discussed from the viewpoint of its potential sources for six remote EANET sites in Japan (Rishiri, Happo, Oki, Ogasawara, Yusuhara, and Hedo) having sufficiently high data completeness during 2000–2004. The annual deposition for each site ranged from 12.1 to 46.6 meq m −2 yr −1 for nss-SO 4 2−, from 5.0 to 21.9 meq m −2 yr −1 for NO 3 −. The ranges of annual deposition of the two ions for the sites were lower than those for urban and rural sites in Japanese Acid Deposition Survey by Ministry of the Environment, Japan, and higher than those for global remote marine sites. Factor analysis was performed on log-transformed daily wet deposition of major ions for each site. The obtained two factors were interpreted as (1) acid and soil source (or acid source for some sites), and (2) sea-salt source for all the sites. This indicates that wet deposition of ions over the remote areas in Japan has a similar structure in terms of types of sources. Factor scores of acid and soil source were relatively high during Kosa (Asian dust) events in spring in western Japan. Back-trajectories for high-deposition episodes of acid and soil source (or acid source) for the remote sites showed that episodic air masses frequently came from the northeastern area of Asian Continent in spring and winter, and from central China in summer and autumn. This indicates a large contribution of continental emissions to wet deposition of ions over the remote areas in Japan.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.