Space- and surface-charge analysis of plasma-preprocessed PTFE thin films

Abstract

The space- and surface-charge behavior of corona-charged polytetrafluoroethylene thin films after plasma processing were studied experimentally by space-charge density distribution measurement and thermally stimulated discharge current (TSDC) measurement. The effect of the antistatic process using low-pressure discharge plasma and charge elimination process dipping in tap water was examined. The surface composition of the samples which were plasma- processed was analyzed with X-ray photoelectron spectroscopy (XPS) to study the mechanisms of antistatic process. It was found that charge elimination of plasma-processed samples was enhanced, independently of the kind of processing gas during the plasma processing. Oxygen and nitrogen atoms were observed from the XPS measurement of plasma-processed samples. In particular, a large amount of nitrogen atoms was found on the surface of the samples plasma processed in pure nitrogen gas. The samples plasma processed in pure nitrogen gas showed a large hetero TSDC peak at room temperature before the charge-elimination process. This might be due to nitrogen atoms on the sample surface that were generated during plasma processing.