Abstract

An nMOS transistor in input/output pad as the ESD protection element is usually in the form of multi-finger layout. This paper will show simple but effective ways to improve an nMOSFET’s ESD robustness or LU immunity for use in I/O pads, i.e., the source-end layout influences on the protection components in ESD/LU capabilities of the input/output pads will be investigated. In other words, they are used to increase the effective ESD or LU capability of the ESD protection elements. Here, the different source-end layout types will be carried out the important snapback parameters. We focus on exploring the secondary breakdown current (It2) and holding voltage (Vh) for the ESD discharge capability and the latch-up immunity, hopefully, it does effectively enhance ESD/LU robustness.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.