SON68 glass alteration under Si-rich solutions at low temperature (35–90 °C): kinetics, secondary phases and isotopic exchange studies

Abstract

Pristine and 29Si-doped SON68 glass were leached in dynamic mode in Si-rich COx water at 42 ppm, pH 8, (35–90 °C) and S/V (900–1800 m−1). Diffusion and surface reaction process governed the glass alteration. The residual rate at 90 °C to 653 days is about 10−3 g m−2 d−1.