Abstract

A study of the internal yield, depletion width, and absorption constant is presented for dc glow discharge P-I-N amorphous silicon films. Internal yields of ∼0.9 at 475 nm and depletion widths as large as 0.37 μm were observed at low illumination levels and were characteristic of the better cells. The absorption constant as a function of wavelength showed no anomalies and was comparable to rf glow discharge films with an optical gap of 1.68 eV. A unique aspect of these cells is that the top P layer is amorphous boron.

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