Abstract

Thin lead films (Pb) of thickness ranging from 21.6 to 245 nm are deposited onto crystalline mica substrates under a pressure of 1.33 × 10−3 Pa. Using ellipsometery the real (e1) and imaginary (e2) parts of dielectric constant and energy loss function, −Im (e)−1and −Im(e + 1)−1 are calculat-ed. The low energy peaks are interpreted in terms of parallel band transition, while the high-energy peaks are interpreted by surface plasmons oscillations. Crystal size of films is obtained by X-ray diffraction. It is found that the crystal size increases by increasing film thickness. Dunne Bleischichten (Pb) mit Dicken zwischen 21,6 und 245 nm werden auf kristalline Glimmer-substrate unter einem Druck von 1,33 × 10−3 Pa abgeschieden. Mittels Ellipsometrie werden Real (e1)- und Imaginar (e2)-Teil der Dielektrizitatskonstunte und Verlustfunktion −Im(e)−1 und −Im(e + 1)−1 berechnet. Die Niederenergiemaxima werden mit Parallelbandubergangen inter-pretiert, wahrend die Hochenergiemaxima mit Oberflachenplasmonenschwingungen interpretiert werden. Die Kristallgrose der Schichten wird mittels Rontgenbeugung bestimmt. Es wird gefun-den, das die Kristallgrose sich mit wachsender Schichtdicke vergrosert.

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