Abstract
The photolytic decomposition of the Trikhlorbifenil mixture, 2,4,5- and 2,4,6-trichlorobiphenyls under an influence of ultraviolet radiation in presence of tungsten oxide as a catalyst in a methanol medium was studied. A higher rate of photolysis of individual congeners of polychlorbiphenyls was established compared to the congeners of the Trikhlorbifenil mixture. The influence of structural features of polychlorarenes on a depth of photodecomposition and a routes of formation of photodestruction products was considered.
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