Solvent‐Templated Electrodeposition of Mesoporous Nickel Oxide Layers for Solar Cell Applications

Abstract

AbstractSolvent engineering for the electrochemical preparation of porous, thick, and adherent nickel oxide layers is investigated. The deposition of this oxide is studied in pure aprotic dimethyl sulfoxide (DMSO) medium and in DMSO/water mixtures through the cathodic reduction of a nickel nitrate precursor. In pure DMSO, the as‐grown layers were a mixture of directly obtained NiO and metallic nickel. On the other hand, in the presence of water, β‐Ni(OH)2 and Ni° mixed layers were formed. In the absence of water or at low water contents, we show that the solvent is included in the layer. After annealing at a sufficient temperature to eliminate DMSO, pores are released and mesoporous films are formed. These solvent‐templated electrodeposited layers have been applied in p‐type dye‐sensitized solar cells (p‐DSSCs) after sensitization by the P1 dye. For high water content (25 vol.%), the electrodeposited layers were non‐porous and were consequently unsuitable for p‐DSSC application.