Abstract
AbstractSemiconducting magnesium silicide (Mg2Si) thin films were synthesized by solid state reaction on Si substrates deposited at various sputtering powers. X‐ray diffraction (XRD), Laser confocal Raman microscopy and Scanning electron microscopy (SEM) were used to characterize the crystal structure and surface morphology of the obtained Mg2Si films. XRD and Raman scattering spectra results show the formation of single phase Mg2Si thin films on Si substrates. SEM images show Mg2Si thin films on Si substrates with fine and compact grains were obtained. (© 2013 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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