Abstract
The layers grown by thermal oxidation of indium phosphide coated with vacuum-deposited nickel were characterized by ellipsometry, IR spectroscopy, x-ray energy spectroscopy, x-ray diffraction, and electrical measurements. The results demonstrate that the layers consist mainly of indium phosphates and nickel phosphates and polyphosphates. The Ni layer acts as a barrier which prevents phosphorus diffusion to the surface and ensures the growth of phosphates and polyphosphates in the surface layer. A model for the thermal oxidation of Ni/InP structures is proposed.
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