Abstract
Solid‐state nuclear magnetic resonance (NMR) spectroscopy is applied to the study of films from pulsed plasma enhanced chemical vapor deposition from two hydrofluorocarbon gases, and . Beyond confirming the relative fractions obtained from X‐ray photoelectron spectroscopy, NMR offered greater structural insight into the plasma film network. NMR identified various network sequences, three , five , and three segments, based on differences in next nearest neighbor attachment. NMR distinguished between and bond configurations, with further separation of unsaturated nonfluorinated carbons into two distinct types. One is attributed to aromatic or graphitic carbon structures while the other is due to unsaturated carbons in closer proximity to fluorines. NMR also allowed changes in structure to be probed upon film thermal decomposition. The film from showed both precursor desorption and detachment, while that from showed only loss. © 1999 The Electrochemical Society. All rights reserved.
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