Abstract
Pure Al film with surface roughness, incompletely nitrided Al film (Al–N film), and transparent AlN film are deposited in turn on a glass substrate by an rf sputtering method. The Al film as the infrared reflector with optimized surface roughness is prepared by a method of two-step deposition of an Al layer at two different substrate temperatures. By coating with an Al–N film, the Al film reduces its diffuse reflectance while maintaining its characteristic low emittance. It is also confirmed that the top layer of the AlN film can perform the role of antireflector coating even if the surface is rough. As a result, an optimized AlN/Al–N/Al film with surface roughness on the glass substrate realizes the high performance of a solar selective absorber, e.g., high solar absorptance of 0.92 and low normal emittance of 0.06 at 373 K.
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