Abstract
Abstract The photopolymerization of methyl methacrylate (MMA) was carried out using semiconductor (CdS) as a photocatalyst in the presence of solar radiation. The photopolymerization of MMA has been achieved (6–9% conversion) on exposure to solar radiation for a stipulated time period in the intensity range 450–800 W/m2. A little higher conversion (∼11%) with higher molecular weight was achieved in the presence of CdS as a photocatalyst. In the presence of an electron donor like Et3N along with the photocatalyst (CdS), the highest conversion of 26–45% with lower molecular weight was achieved. The polymers have been characterized by viscometry and gel permeation chromatography (GPC).
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