Abstract
We report on a high performance Pt/n−Ga2O3/n+Ga2O3 solar blind Schottky photodiode that has been grown by metalorganic chemical vapor deposition. The active area of the photodiode was fabricated using ∼30 Å thick semi-transparent Pt that has up to 90% transparency to UV radiation with wavelengths < 260 nm. The fabricated photodiode exhibited Schottky characteristics with a turn-on voltage of ∼1 V and a rectification ratio of ∼108 at ±2 V and showed deep UV solar blind detection at 0 V. The Schottky photodiode exhibited good device characteristics such as an ideality factor of 1.23 and a breakdown voltage of ∼110 V. The spectral response showed a maximum absolute responsivity of 0.16 A/W at 222 nm at zero bias corresponding to an external quantum efficiency of ∼87.5%. The cutoff wavelength and the out of band rejection ratio of the devices were ∼260 nm and ∼104, respectively, showing a true solar blind operation with an excellent selectivity. The time response is in the millisecond range and has no long-time decay component which is common in photoconductive wide bandgap devices.
Highlights
High quality, homoepitaxial, lightly Si doped β-Ga2O3 was grown on a Sn doped (010) β-Ga2O3 substrate using an Agnitron Technology Agilis R&D metalorganic chemical vapor deposition (MOCVD) system
We report on a high performance Pt/n−Ga2O3/n+Ga2O3 solar blind Schottky photodiode that has been grown by metalorganic chemical vapor deposition
A significant body of work has been reported on Ga2O3 based photodetectors by growing epitaxial films on c-plane sapphire substrates by molecular beam epitaxy (MBE),27,28 pulsed laser deposition (PLD),29 and MOCVD14 methods
Summary
Homoepitaxial, lightly Si doped β-Ga2O3 was grown on a Sn doped (010) β-Ga2O3 substrate using an Agnitron Technology Agilis R&D MOCVD system. We report on a high performance Pt/n−Ga2O3/n+Ga2O3 solar blind Schottky photodiode that has been grown by metalorganic chemical vapor deposition.
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