Abstract

Ga2O3-based avalanche photodetectors (APDs) have gained increasing attention because of their excellent photoelectric conversion capability in the UV solar-blind region. Integrating high-quality epitaxial Ga2O3 with p-type semiconductor remains an open challenge associated with the integration difficulty on alleviating its defects and dislocations. Herein, we construct an APD consisting of epitaxial β-Ga2O3/La0.8Ca0.2MnO3 heterostructure. The pn junction APDs exhibit a high responsivity of 568 A/W as well as an enhanced avalanche gain of up to 3.0×105 at a reverse bias voltage of 37.9 V. The integration capability demonstrated in this work provides exciting opportunities for further development of high-performance Ga2O3-based electronics and optoelectronics.

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