Abstract
Multilayer structures of alternating thin titanium and tungsten oxide layers having dimensions of ∼20 nm have been fabricated from titanium alkoxide and various tungstate precursor solutions using the dip coating technique. Single, double, and triple layer titanate and tungstate thin films were deposited on silicon substrates, and these films were initially annealed at 400 °C. Structural and microstructural aspects of the films were investigated using a variety of techniques, including X-ray reflectometry, grazing incidence X-ray absorption spectroscopy (GIXAS), cross-sectional transmission electron microscopy (TEM), and secondary ion mass spectrometry. The dimensions of the films and the character of the interfaces were principally gauged by cross-sectional TEM and X-ray reflectometery. All films were continuous on a local scale and had relatively low surface roughness. At the treatment temperature of 400 °C, only the tungsten oxide component showed appreciable crystallinity. The multilayer films had rel...
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