Sol–gel preparation of double-layer tri-wavelength antireflective coating

Abstract

Double-layer tri-wavelength antireflective (AR) coating effective simultaneously at 351, 527 and 1,053 nm has been designed and prepared by the sol–gel process. The refractive index and film thickness of bottom layer and up layer are 1.27 and 113 nm, and 1.17 and 245 nm, respectively. The bottom layer with refractive index of 1.27 was prepared from a mixture of acid-catalyzed and base-catalyzed silica sols, and the up layer with refractive index of 1.17 was prepared from polypropylene oxide modified silica sol. It was found that the addition of polypropylene oxide into the sol significantly decreased the refractive index and increased the hydrophobicity of the AR coating. The obtained tri-wavelength AR coating gives very high transmittance of 99.7, 99.1 and 98.0 % at 351, 527 and 1,053 nm, simultaneously.