Abstract

We report a method to prepare hydrophobic, antireflective mesoporous silica-based films on polymer substrates from sol–gel approaches combined with an ammonia vapor treatment (AVT) to avoid any thermal curing. Strategies involving the combination of direct co-condensation of pure and methylated-hybrid silica precursors with further post-functionalization with methyl groups were used. Coatings with the best reflectance (transmittances up to 99.6% in the visible range), full water repellence, and good resistance to abrasion (failures occurred at the substrate interfaces) were obtained by optimizing both sol–gel and AVT conditions. Using in situ, time-resolved, spectroscopic ellipsometry, we demonstrate that the structure of the film can be significantly and rapidly modified from molecular to mesoscales, under the action of H2O and NH3 vapors. The identified mechanism follows a local dissolution/condensation associated to Ostwald ripening that can easily be controlled by adjusting the applied conditions. The...

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