Abstract
To reduce the dimensions of photonic integrated circuits, high-contrast wavelength-scale structures are needed. We developed a fabrication process for Silicon-on-insulator nanophotonics, based on standard CMOS processing techniques with deep UV lithography. Measurements using either end-fire incoupling or grating-based fibre couplers show photonic crystal waveguides with moderate propagation losses (7.5 dB/mm) and photonic wires with very low propagation losses (0.24 dB/mm).
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