Abstract
In this work, we introduce a novel concept of hybrid nano-imprint mold based on a soft substrate with rigid relief features. Our approach combines the advantages of soft and rigid molding approaches, and at the same time overcomes their drawbacks. Specifically, this mold provides a unique combination of: (1) High pattern fidelity and small feature size as offered by hard molds and (2) low sensitivity to defects and ability to pattern curved substrates as offered by soft molds. The SSRF mold was fabricated by electron-beam lithography of Hydrogen Silsesquioxane (HSQ) on a sacrificial substrate, followed by transferring the obtained HSQ features to elastomeric PDMS substrate. The pattern replication was demonstrated on nano imprint of UV-curable resist.
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