Abstract
It is known that focused ion beam chemical vapor deposition (FIB-CVD) is useful to form 3D nano-structures. In this method, carbon based material was formed by gallium focused ion beam assisted deposition using phenanthrene as a carbon source. In the previous study, carbon thin film formed by FIB-CVD was considered to be diamond like carbon (DLC), however, the structural properties based on electronic states have not been sufficiently understood. In the present study, we investigate the electronic states of carbon thin film formed by FIB-CVD method by the measurement of near edge X-ray absorption fine structure (NEXAS) of the carbon K edge using synchrotron radiation. In addition, soft X-ray emission spectrum was observed with an electron probe microanalyzer (EPMA).
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